Semiconductor memory device

ABSTRACT

A semiconductor memory device includes wirings arranged in parallel along a first direction, the wirings including first and second wirings that are adjacent and a third wiring adjacent to the second wiring, a first pillar between the first and second wirings and a second pillar between the second and third wirings, the first and second pillars each extending in a second direction crossing the first direction toward the semiconductor substrate, and first and second bit lines connected to the first and second pillars, respectively. A first voltage is applied to the second wiring during a program operation on a first memory cell at an intersection of the second wiring and the first pillar, and a second voltage higher than the first voltage is applied to the second wiring during a program operation on a second memory cell at an intersection of the second wiring and the second pillar.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a continuation of U.S. patent application Ser. No.16/356,967, filed on Mar. 18, 2019, which is a continuation of U.S.patent application Ser. No. 15/909,906, filed on Mar. 1, 2018, now U.S.Pat. No. 10,269,828, granted on Apr. 23, 2019, which is based upon andclaims the benefit of priority from Japanese Patent Application No.2017-061208, filed Mar. 27, 2017, and Japanese Patent Application No.2017-168249, filed Sep. 1, 2017, the entire contents of each of whichare incorporated herein by reference.

FIELD

Embodiments described herein relate generally to a semiconductor memorydevice.

BACKGROUND

Semiconductor memories in which memory cells are arrangedthree-dimensionally, are known.

DESCRIPTION OF THE DRAWINGS

FIG. 1 is a block diagram of a semiconductor memory device according toa first embodiment.

FIG. 2 is a circuit diagram of a memory cell array according to thefirst embodiment.

FIG. 3 is a planar layout of a select gate line according to the firstembodiment.

FIG. 4 is a planar layout of a word line according to the firstembodiment.

FIG. 5 is a cross-sectional view of a block according to the firstembodiment.

FIG. 6 is a cross-sectional view of a block according to the firstembodiment.

FIG. 7 is a cross-sectional view of a memory cell transistor accordingto the first embodiment.

FIG. 8 is a cross-sectional view of the memory cell transistor accordingto the first embodiment.

FIG. 9 is a cross-sectional view of the memory cell transistor accordingto the first embodiment.

FIG. 10 is a cross-sectional view of the memory cell transistoraccording to the first embodiment.

FIG. 11 is an equivalent circuit diagram of a memory pillar according tothe first embodiment.

FIG. 12 is a planar layout of the select gate line according to thefirst embodiment.

FIG. 13 is a planar layout of the select gate line according to thefirst embodiment.

FIG. 14 is a timing chart of various signals at the time of a readoperation according to the first embodiment.

FIG. 15 is a planar layout of a select gate line according to a firstmodified example of the first embodiment.

FIG. 16 is a timing chart of various signals at the time of a writeoperation according to a second embodiment.

FIG. 17 is a timing chart of various signals at the time of the writeoperation according to the second embodiment.

FIG. 18 is a planar layout of a select gate line according to a thirdembodiment.

FIG. 19 is a planar layout of the select gate line according to thethird embodiment.

FIG. 20 is a planar layout of the select gate line according to thethird embodiment.

FIG. 21 is a planar layout of the select gate line according to thethird embodiment.

FIG. 22 is a planar layout of a select gate line according to a firstmodified example of the third embodiment.

FIG. 23 is a planar layout of a select gate line according to a secondmodified example of the third embodiment.

FIG. 24 is a planar layout of a select gate line according to a fourthembodiment.

FIG. 25 is a planar layout of a select gate line according to a firstmodified example of the fourth embodiment.

FIG. 26 is a planar layout of a select gate line according to a secondmodified example of the fourth embodiment.

FIG. 27 is a planar layout of a word line according to first modifiedexamples of the first to fourth embodiments.

FIG. 28 is an equivalent circuit diagram of a memory pillar according tosecond modified examples of the first to fourth embodiments.

FIG. 29 is a cross-sectional view of a partial area of a memory pillaraccording to third modified examples of the first to fourth embodiments.

DETAILED DESCRIPTION

Embodiments provide a semiconductor memory device capable of improvingoperational reliability.

In general, according to one embodiment, there is provided asemiconductor memory device including a plurality of wirings at a samelevel above a semiconductor substrate, that are arranged in parallelwith each other along a first direction, the wirings including first andsecond wirings that are adjacent and a third wiring that is adjacent tothe second wiring, a first pillar between the first and second wiringsand a second pillar between the second and third wirings, the first andsecond pillars each extending in a second direction crossing the firstdirection toward the semiconductor substrate, and a first bit lineconnected to the first pillar and a second bit line connected to thesecond pillar. A first program voltage is applied to the second wiringduring a program operation performed on a first memory cell at anintersection of the second wiring and the first pillar, and a secondprogram voltage higher than the first program voltage is applied to thesecond wiring during a program operation performed on a second memorycell at an intersection of the second wiring and the second pillar.

Hereinafter, embodiments will be described with reference to thedrawings. In the description presented below, a common reference numeralwill be given to elements having the same function and the sameconfiguration.

1. First Embodiment

A memory system according to a first embodiment will be described.Hereinafter, a memory system including a NAND flash memory as asemiconductor memory device will be described as an example.

1.1 Configuration

The configuration of a NAND flash memory according to this embodimentwill be described.

1.1.1 Entire Configuration

First, the entire configuration of the NAND flash memory according tothis embodiment will be described with reference to FIG. 1.

As illustrated in the drawing, the NAND flash memory 1 includes a memorycell array 2, a row decoder 3, and a sense amplifier 4.

The memory cell array 2 includes a plurality of blocks BLK. While onlyfour blocks BLK0 to BLK3 are illustrated in FIG. 1, the number of theblocks is not particularly limited. Each of the blocks BLK includes aplurality of memory cells that are three-dimensionally stacked inassociation with a row and a column. The blocks BLK are disposed on asemiconductor substrate, and a slit SLT1 is formed between the blocksadjacent to each other. Details of the configuration of the memory cellarray 2 will be described later.

The row decoder 3 decodes a row address received from the outside. Then,the row decoder 3 selects a row direction of the memory cell array 2based on a result of the decoding. More specifically, the row decoder 3applies voltages to various wirings used for selecting the rowdirection.

The sense amplifier 4 senses data read from one block BLK when data isto be read. In addition, the sense amplifier 4 applies a voltagecorresponding to write data to the memory cell array 2 when data is tobe written.

1.1.2 Configuration of Memory Cell Array 2

Next, the configuration of the memory cell array 2 according to thisembodiment will be described.

<Circuit Configuration>

First, the circuit configuration of the memory cell array 2 will bedescribed with reference to FIG. 2. FIG. 2 is an equivalent circuitdiagram of a block BLK. As illustrated in the drawing, the block BLKincludes a plurality of memory groups MG (MG0, MG1, MG2, . . . ). Eachmemory group MG includes a plurality of NAND strings 50. Hereinafter, aNAND string of an even-numbered memory group MGe (MG0, MG2, MG4, . . . )will be referred to as a NAND string 50 e, and a NAND string of anodd-numbered memory group MGo (MG1, MG3, MG5, . . . ) will be referredto as a NAND string 50 o.

Each NAND string 50 includes, for example, eight memory cell transistorsMT (MT0 to MT7) and selection transistors ST1 and ST2. Each memory celltransistor MT includes a control gate, a charge storage layer, and thelike and stores data in a nonvolatile manner. The memory cell transistorMT is connected in series between a source of the selection transistorST1 and a drain of a selection transistor ST2.

The gates of the selection transistors ST1 of each memory group MGe areconnected to a select gate line SGD (SGD0, SGD1, . . . ). The selectgate lines SGD are independently controlled by the row decoder 3. Thegates of the selection transistors ST2 of each even-numbered memorygroup MGe (MG0, MG2, . . . ), for example, are connected in common to aselect gate line SGSe, and the gates of the selection transistors ST2 ofeach odd-numbered memory group MGo (MG1, MG3, . . . ), for example, areconnected in common to a select gate line SGSo. The select gate linesSGSe and SGSo, for example, may be commonly connected or not so as to beindependently controllable.

The control gates of the memory cell transistors MT (MT0 to MT7)provided in a memory group MGe inside a same block BLK are commonlyconnected to word lines WLe (WLe0 to WLe7) respectively. On the otherhand, the control gates of the memory cell transistors MT (MT0 to MT7)provided in a memory group MGo are commonly connected to word lines WLo(WLo0 to WLo7) respectively. The select gate lines WLe and WLo areindependently controlled by the row decoder 3.

A block BLK is, for example, a unit for erasing data. In other words,data stored by memory cell transistors MT provided in a same block BLKis erased collectively.

In addition, within the memory cell array 2, drains of the selectiontransistors ST1 of the NAND strings 50 disposed in a same column arecommonly connected to a bit line BL (BL0 to BL(L−1) (here, (L−1) is anatural number of two or more)). In other words, a bit line BL connectsthe NAND strings 50 in common across a plurality of memory groups MG.Furthermore, sources of a plurality of selection transistors ST2 areconnected in common to the source line SL.

In other words, the memory group MG includes the plurality of NANDstrings 50 that are connected to different bit lines BL and areconnected to the same select gate line SGD. In addition, the block BLKincludes a plurality of memory groups MG having word lines WL in common.The memory cell array 2 includes a plurality of blocks BLK having thebit lines BL in common. Within the memory cell array 2, the select gateline SGS, the word line WL, and the select gate line SGD are stackedabove the semiconductor substrate, whereby the memory cell transistorsMT are three-dimensionally stacked.

<Planar Layout of Memory Cell Array>

Next, the planar configuration of the memory cell array 2 will bedescribed. FIG. 3 illustrates a planar layout of select gate lines SGDof a certain block BLK inside a semiconductor substrate plane (this willbe referred to as an XY plane). In this example, a case where eightselect gate lines SGD are provided within one block BLK will bedescribed.

As illustrated in the drawing, nine conductive layers 10 (10-0 to 10-7;here, 10-0 includes 10-0 a and 10-0 b) extending in an X direction arearranged in a Y direction orthogonal to the X direction. Each conductivelayer 10 functions as a select gate line SGD. In the example illustratedin FIG. 3, within the block BLK, two wiring layers 10-0 a and 10-0 bpositioned at both ends in the Y direction function as a select gateline SGD0. In other words, two wiring layers 10 positioned at both endsin the Y direction are connected in common to be controlled by the rowdecoder 3 in the same manner. Seven wiring layers 10-1 to 10-7interposed therebetween respectively function as select gate lines SGD1to SGD7. Accordingly, when seen in the XY plane within the block BLK,memory groups MG1 to MG7 are arranged in the Y direction, and a memorygroup MG0 is disposed on both sides thereof.

Within the block BLK, wiring layers 10 adjacent to each other in the Ydirection are separated from each other by an insulating film notillustrated in the drawing. A region in which this insulating film isdisposed is called a slit SLT2. In the slit SLT2, the insulating film isembedded, for example, in regions of the semiconductor substrate planeat least up to a layer in which the wiring layer 10 is disposed. Inaddition, within the memory cell array 2, the plurality of blocks BLKillustrated in FIG. 3 are arranged, for example, in the Y direction. Theblocks BLK adjacent in the Y direction are separated from each other byan insulating film not illustrated in the drawing. A region in whichthis insulating film is disposed is the slit SLT1 described withreference to FIG. 1. The slit SLT1 is similar to the slit SLT2.

Furthermore, between the wiring layers 10 adjacent in the Y direction, aplurality of memory pillars MP (MP0 to MP15) extending along a Zdirection are disposed. The Z direction is a direction orthogonal to theX and Y directions, in other words, is a direction perpendicular to thesemiconductor substrate plane.

More specifically, memory pillars MP0 and MP8 are disposed between thewiring layers 10-1 and 10-2, memory pillars MP1 and MP9 are disposedbetween the wiring layers 10-3 and 10-4, memory pillars MP2 and MP10 aredisposed between the wiring layers 10-5 and 10-6, and memory pillars MP3and MP11 are disposed between the wiring layers 10-7 and 10-0 b. Thememory pillar MP is a structural element forming the selectiontransistors ST1 and ST2 and the memory cell transistor MT, and detailsthereof will be described later.

The memory pillars MP0 to MP3 are arranged in the Y direction. Thememory pillars MP8 to MP11 are adjacent to the memory pillars MP0 to MP3in the X direction and are arranged in the Y direction. In other words,the memory pillars MP0 to MP3 and the memory pillars MP8 to MP11arranged in parallel with respect to each other.

A bit line BL0 is disposed above the wiring layer 10 to be commonlyconnected to the memory pillars MP0 to MP3. In addition, a bit line BL2is disposed above the wiring layer 10 to be commonly connected to thememory pillars MP8 to MP11. Hereinafter, the memory pillars MP0 to MP3,the memory pillars MP8 to MP11, and the bit lines BL0 and BL2 may bereferred to as a group GR1.

In addition, memory pillars MP4 and MP12 are disposed between the wiringlayers 10-0 a and 10-1, memory pillars MP5 and MP13 are disposed betweenthe wiring layers 10-2 and 10-3, memory pillars MP6 and MP14 aredisposed between the wiring layers 10-4 and 10-5, and memory pillars MP7and MP15 are disposed between the wiring layers 10-6 and 10-7.

The memory pillars MP4 to MP7 are arranged in the Y direction, and thememory pillars MP12 to MP15 are arranged in the Y direction as well. Thememory pillars MP4 to MP7 are positioned between the memory pillars MP0to MP3 and the memory pillars MP8 to MP11 in the X direction. Inaddition, the memory pillars MP12 to MP15 and the memory pillars MP4 toMP7 are positioned to have the memory pillars MP8 to MP11 interposedtherebetween in the X direction. In other words, the memory pillars MP4to MP7 and the memory pillars MP12 to MP15 are arranged in parallel withrespect to each other.

A bit line BL1 is disposed above the wiring layer 10 to be commonlyconnected to the memory pillars MP4 to MP7. In addition, a bit line BL3is disposed above the wiring layer 10 to be commonly connected to thememory pillars MP12 to MP15. Hereinafter, the memory pillars MP4 to MP7,the memory pillars MP12 to MP15, and the bit lines BL1 and BL3 may bereferred to as a group GR2.

In other words, the memory pillars MP are disposed to straddle twowiring layers 10 in the Y direction and to be embedded in a part of theslit SLT2, and two memory pillars MP adjacent to each other in the Ydirection are present in one slit SLT2. The slit SLT2 in which thememory pillars MP belonging to the group GR1 are embedded is positionedbetween two memory pillars MP belonging to the group GR2, and the slitSLT2 in which the memory pillars MP belonging to the group GR2 areembedded is positioned between two memory pillars MP belonging to thegroup GR1.

In addition, no memory pillar MP is disposed between the wiring layers10-0 a and 10-0 b that are adjacent to each other with the slit SLT1interposed therebetween.

FIG. 4, similar to FIG. 3, illustrates a planar layout of word lines WLin the XY plane. FIG. 4 corresponds to a region corresponding to oneblock illustrated in FIG. 3 and is a layout of the wiring layer 11disposed in a lower layer than the wiring layer 10 described withreference to FIG. 3.

As illustrated in the drawing, nine conductive layers 11 (11-0 to 11-7;here 11-0 includes 11-0 a and 11-0 b) extending in the X direction arearranged in the Y direction. The wiring layers 11-0 to 11-7 arerespectively disposed right below the wiring layers 10-0 to 10-7 with aninsulating film in between.

Each conductive layer 10 functions as a word line WL7. The other wordlines WL0 to WL6 have the same structure as the word line WL7. In theexample illustrated in FIG. 4, the wiring layers 11-0 a, 11-2, 11-4,11-6, and 11-0 b function as a word line WLe7. Such wiring layers 11-0a, 11-2, 11-4, 11-6, and 11-0 b are drawn out up to an end portion (thiswill be referred to as a first connection portion) in the X directionand are commonly connected to each other. In the first connectionportion, the wiring layers 11-0 a, 11-2, 11-4, 11-6, and 11-0 b areconnected to the row decoder 3.

In addition, the wiring layers 11-1, 11-3, 11-5, and 11-7 function as aword line WLo7. Such wiring layers 11-1, 11-3, 11-5, and 11-7 are drawnout up to a second connection portion positioned on a side opposite tothe first connection portion in the X direction and are commonlyconnected to each other. In the second connection portion, the wiringlayers 11-1, 11-3, 11-5, and 11-7 are connected to the row decoder 3.

A memory cell portion is disposed between the first connection portionand the second connection portion. In the memory cell portion, thewiring layers 11 adjacent to each other in the Y direction are separatedfrom each other by the slit SLT2 described with reference to FIG. 3. Inaddition, the wiring layers 11 between the blocks BLK adjacent to eachother in the Y direction are similarly separated from each other by theslit SLT1. In addition, in the memory cell portion, similar to FIG. 3,memory pillars MP0 to MP15 are disposed.

The configuration described above is similar also in a layer in whichthe other word lines WL and the select gate lines SGS are formed.

<Cross-Sectional Structure of Memory Cell Array>

Next, the cross-sectional structure of the memory cell array 2 will bedescribed. FIG. 5 is a cross-sectional view of the block BLK taken inthe Y direction and illustrates a cross-sectional structure of a regionextending along the bit line BL0 in FIG. 3 as an example.

As illustrated in the drawing, above a semiconductor substrate (forexample, a p-type well region) 13, a wiring layer 12 functioning as aselect gate line SGS is disposed. Above the wiring layer 12, wiringlayers 11 of eight layers functioning as word lines WL0 to WL7 arestacked in the Z direction. FIG. 4 illustrates the planar layout of suchwirings 11 and 12. Above the wiring layer 11, a wiring layer 10functioning as a select gate line SGD is disposed. The planar layout ofthe wiring layer 10 is as described with reference to FIG. 3.

From the wiring layer 10 to the semiconductor substrate 13, the slitSLT2 and the memory pillar MP are alternately disposed in the Ydirection. As described above, the actual form of the slit SLT2 is aninsulating film. A contact plug used for applying a voltage to a regiondisposed inside the semiconductor substrate 13 and the like may bedisposed inside the slit SLT2. For example, a contact plug used forconnecting the source of the selection transistor ST2 to a source linemay be disposed therein.

The wiring layers 12 include alternate arrangements of the select gatelines SGSo and SGSe with the slit SLT2 or the memory pillar MPinterposed therebetween. Similarly, the wiring layers 11 includealternate arrangements of the word lines WLo and WLe with the slit SLT2or the memory pillar MP interposed therebetween.

In addition, the slit SLT1 is disposed between the blocks BLK adjacentto each other in the Y direction. As described above, the actual form ofthe slit SLT1 is an insulating film. A contact plug used for applying avoltage to a region disposed inside the semiconductor substrate 13 andthe like may be disposed inside the slit SLT1. For example, a contactplug used for connecting the source of the selection transistor ST2 to asource line or a groove-shaped conductor may be disposed therein. Thewidth of the slit SLT1 in the Y direction is larger than the width ofthe slit SLT2 in the Y direction.

On the memory pillar MP, a contact plug 16 is disposed, and the wiringlayer 15 functioning as the bit line BL extends in the Y direction to becommonly connected to each of such contact plugs 16.

FIG. 6 is a cross-sectional view of the block BLK taken along the Xdirection and illustrates a cross-sectional structure of a regionextending along the select gate line SGD2 illustrated in FIG. 3 andpassing through the memory pillars MP5 and MP13 as an example. Asdescribed with reference to FIG. 5, above the semiconductor substrate13, wiring layers 12, 11, and 10 are sequentially disposed. The memorycell portion is as described with reference to FIG. 5.

In a first connection portion, wiring layers 10 to 12 are drawn out, forexample, in a stair shape. In other words, when seen in the XY plane,upper faces of end portions of the wiring layers 11 of seven layers andthe wiring layer 12 are exposed in the first connection portion. Contactplugs 17 are disposed on this exposed region, and the contact plugs 17are connected to a metal wiring layer 18. By using this metal wiringlayer 18, the wiring layers 10 to 12 functioning as the even-numberedselect gate lines SGD0, SGD2, SGD4, and SGD6, the odd-numbered wordlines WLo and the odd-numbered select gate lines SGSo are electricallyconnected to the row decoder 3.

On the other hand, in a second connection portion, similarly, the wiringlayers 10 to 12 are drawn out, for example, in a stair shape. Contactplugs 19 are disposed on an exposed area of the wiring layers 10 to 12,and the contact plugs 19 are connected to a metal wiring layer 20. Byusing this metal wiring layer 20, the wiring layers 10 to 12 functioningas the odd-numbered select gate lines SGD1, SGD3, SGD5, and SGD7, theeven-numbered word lines WLe, and the even-numbered select gate linesSGSe are electrically connected to the row decoder 3. In addition, thewiring layer 10 may be electrically connected to the row decoder 3through the second connection portion instead of the first connectionportion or through both the first connection portion and the secondconnection portion.

<Structure of Memory Pillar and Memory Cell Transistor>

Next, the structures of the memory pillar MP and the memory celltransistor MT will be described.

First Example

First, a first example will be described with reference to FIGS. 7 and8. FIG. 7 is a cross-sectional view of the memory pillar MP in a XYplane, and FIG. 8 is a cross-sectional view in an YZ plane andparticularly illustrates an area in which two memory cell transistors MTare disposed. In the first example, an insulating film is used for thecharge storage layer of the memory cell transistor MT.

As illustrated in the drawing, the memory pillar MP includes aninsulating layer 30 disposed in the Z direction, a semiconductor layer31, and insulating layers 32 to 34. The insulating layer 30 is, forexample, a silicon oxide film. The semiconductor layer 31 is disposed tosurround the periphery of the insulating layer 30 and functions as anarea in which a channel of the memory cell transistor MT is formed. Thesemiconductor layer 31 is, for example, a polycrystalline silicon layer.The insulating layer 32 is disposed to surround the periphery of thesemiconductor layer 31 and functions as a gate insulating film of thememory cell transistor MT. The insulating layer 32, for example, has astacked structure of a silicon oxide film and a silicon nitride film.The insulating layer 33 is disposed to surround the periphery of thesemiconductor layer 31 and functions as a charge storage layer of thememory cell transistor MT. The insulating layer 33, for example, is asilicon nitride film. The insulating layer 34 is disposed to surroundthe periphery of the insulating layer 33 and functions as a blockinsulating film of the memory cell transistor MT. The insulating layer34, for example, is a silicon oxide film. Inside the slit SLT2 exceptfor the memory pillar MP portion, the insulating layer 37 is embedded.The insulating layer 37, for example, is a silicon oxide film.

On the periphery of the memory pillar MP, for example, an AlO layer 35is disposed. On the periphery of the AlO layer 35, for example, abarrier metal layer (TiN film or the like) 36 is formed. On theperiphery of the barrier metal layer 36, a conductive layer 11functioning as a word line WL is disposed. The conductive layer 11, forexample, uses tungsten as its material.

According to the configuration described above, inside one memory pillarMP, two memory cell transistors MT are disposed in the Y direction. Theselection transistor ST1 and ST2 have similar configurations.

Second Example

Next, a second example will be described with reference to FIGS. 9 and10. FIG. 9 is a cross-sectional view of the memory pillar MP in the XYplane. FIG. 10 is a cross-sectional view in the YZ plane andparticularly illustrates an area in which two memory cell transistors MTare disposed. In the second example, a conductive film is used for thecharge storage layer of the memory cell transistor MT.

As illustrated in the drawing, the memory pillar MP includes insulatinglayers 48 and 43 disposed in the Z direction, a semiconductor layer 40,an insulating layer 41, a conductive layer 42, and insulating layers 46a to 46 c. The insulating layer 48, for example, is a silicon oxidefilm. The semiconductor layer 40 is disposed to surround the peripheryof the insulating layer 48. The semiconductor layer 40, for example, isa polycrystalline silicon layer and functions as an area in which achannel of the memory cell transistor MT is formed, similar to theexample illustrated in FIG. 7, is not separated between the memory celltransistors MT disposed inside the same memory pillar MP. The insulatinglayer 41 is disposed on the periphery of the conductive layer 40 andfunctions as a gate insulating layer of each memory cell transistor MT.In other words, the insulating layer 41 is divided into two areas in theXY plane illustrated in FIG. 9, and each area functions as a gateinsulating film of two memory cell transistors MT disposed inside thesame memory pillar MP. The insulating layer 41, for example, has astacked structure of a silicon oxide film and a silicon nitride film.The conductive layer 42 is disposed on the periphery of the insulatinglayer 41 and is divided into two areas by the insulating layer 43 in theY direction. The conductive layer 42, for example, is a polycrystallinesilicon layer, and the divided two areas function as charge storagelayers of the two memory cell transistors MT described above. On theperiphery of the conductive layer 42, the insulating layers 46 a, 46 b,and 46 c are sequentially disposed. The insulating layers 46 a and 46 c,for example, are silicon oxide films, and the insulating layer 46 b, forexample, is a silicon nitride film, and these function as blockinsulating films of the memory cell transistors MT. Such insulatinglayers 46 a, 46 b and 46 c are divided into two areas in the Ydirection, and an insulating layer 43 is disposed therebetween. Inaddition, inside the slit SLT2, the insulating layer 43 is embedded. Theinsulating layer 43, for example, is a silicon oxide film.

On the periphery of the memory pillar MP having the above-describedconfiguration, for example, an AlO layer 45 is disposed. In addition, onthe periphery of the AlO layer 45, for example, a barrier metal layer (aTiN film or the like) 47 is formed. On the periphery of the barriermetal layer 45, the conductive layer 11 functioning as a word line WL isdisposed.

According to the configuration described above, inside one memory pillarMP, two memory cell transistors MT are disposed in the Y direction. Theselection transistors ST1 and ST2 have similar configurations. Inaddition, between the memory cell transistors adjacent to each other inthe Z direction, an insulating layer not illustrated in the drawing isdisposed, and the charge storage layer 42 is insulated for each memorycell transistor by this insulating layer and the insulating layers 43and 46.

Equivalent Circuit

FIG. 11 is an equivalent circuit diagram of the memory pillar MP havingthe configuration described above. As illustrated in the drawing, twoNAND strings 50 o and 50 e are formed in one memory pillar MP. In otherwords, selection transistors ST1 disposed in the same memory pillar MPare connected to different select gate lines SGD, and memory celltransistors MT are connected to different word lines WLo and WLe. Inaddition, selection transistors ST2 are connected to different selectgate lines SGSo and SGSe. The two NAND strings 50 o and 50 e formed inthe same memory pillar MP are connected to the same bit line BL and thesame source line SL. However, current paths thereof are electricallyseparated.

1.2 Read Operation

Next, a data reading method for the NAND flash memory having theconfiguration described above will be described.

First, the appearance in which a select gate line SGD is selected willbe described with reference to FIGS. 12 and 13. FIGS. 12 and 13 areplanar layout diagrams of the select gate line SGD in the XY plancorresponding to FIG. 3 described above, and diagonal lines are appliedto a wiring layer 10 corresponding to a selected gate line SGD.

As illustrated in FIG. 12, when one of select gate lines SGD1 to SGD7 isto be selected, one of corresponding wiring layers 10-1 to 10-7 isselected. FIG. 12 illustrates a case where the select gate line SGD1 isselected. As the wiring layer 10-1 is selected, four memory celltransistors MT disposed in the memory pillars MP0, MP4, MP8, and MP12are selected. In other words, one page is formed by four memory celltransistors MT belonging to a wiring layer 11-1 corresponding to one ofthe word lines WL disposed below the wiring layer 10-1. This similarlyapplies also to a case where one of the select gate lines SGD2 to SGD7is selected.

In contrast to this, both wiring layers 10-0 a and 10-0 b positioned atboth ends within the block BLK are simultaneously selected. Thiscorresponds to a case where the select gate line SGD0 is selected. Thisappearance is illustrated in FIG. 13.

As illustrated in the drawing, when the select gate line SGD0 is to beselected, two memory cell transistors MT that are positioned right belowthe wiring layer 10-0 a and are disposed in the memory pillars MP4 andMP12 and two memory cell transistors MT that are positioned right belowthe wiring layer 10-0 b and are disposed in the memory pillars MP3 andMP11 are selected. In other words, one page is formed by such fourmemory cell transistors MT.

FIG. 14 is a timing diagram that illustrates voltage changes in variouswirings when an odd-numbered select gate line SGDo (in other words, anodd-numbered memory group MG) and a word line WLo0 are selected.

As illustrated in the drawing, first, at time t1, a voltage VSG isapplied to all the select gate lines SGD in the selected block BLK, andthe selection transistor ST1 enters an On-state. In addition, a voltageVREAD is applied to all the word lines, and the memory cell transistorMT enters the On-state regardless of the stored data. Furthermore, avoltage VSG is applied to all the select gate lines SGS, and theselection transistor ST2 enters the On-state. Accordingly, all the NANDstrings 50 of the selected block BLK are in the conductive state, and avoltage VSS (for example, 0 V) is transmitted to the channel.

Next, at time t3, the sense amplifier 4 pre-charges the bit line BL. Atthis time, even-numbered bit lines BL0 and BL2 belonging to the groupGR1 are pre-charged to a voltage VBL2, and odd-numbered bit lines BL1and BL3 belonging to the group GR2 are pre-charged to a voltage VBL1that is higher than the voltage VBL2.

Then, at time t4, a voltage VSG is applied to the selected select gatelines SGD and SGSo, a read voltage VCGRV is applied to the selected wordline WLo0, a voltage VNEG is applied to the non-selected word line WLe0,and a voltage VREAD is applied to the other non-selected word lines WL1to WL7. The voltage VCGRV is a voltage corresponding to a read level andis a voltage used for determining whether stored data of the selectedmemory cell transistor MT is “0” or “1”. The voltage VNEG, for example,is a negative voltage or 0 V and is a voltage used for turning off thememory cell transistor MT.

As a result, when the selected memory cell transistor MT is turned on, acurrent flows from the bit line BL to the source SL. On the other hand,when the selected memory cell transistor MT is turned off, no currentflows. Accordingly, the stored data of the selected memory celltransistor MT is determined.

1.3 Effect According to this Embodiment

According to this embodiment, variations in the memory cellcharacteristics between the memory groups MG are corrected, and theoperational reliability of the semiconductor memory device can beimproved. This effect will be described below.

In the semiconductor memory device according to this embodiment, asdescribed with reference to FIGS. 3 and 4, one memory pillar MP isdisposed to straddle two select gate lines SGD aligned in the XY planeand two word lines WL. Then, two memory cell transistors MT are disposedinside this memory pillar MP and are controlled using the two selectgate lines SGD and the word lines WL.

In this configuration, there are cases where a deviation occurs in apositional relation between the memory pillar MP and corresponding twoword lines WL (and the select gate lines SGD). More specifically, inFIGS. 3 and 4, for any one memory pillar MP, it is preferable that acenter portion of the memory pillar MP in the Y direction is positionedexactly between the corresponding two word lines. The reason for this isthat, by arranging the memory pillars MP as such, the sizes of the twomemory cell transistors MT controlled by the corresponding two wordlines WL are the same.

However, in a case where the position of the memory pillar MP deviates,the sizes of the corresponding two memory cell transistors MT aredifferent from each other. For example, in the examples illustrated inFIGS. 3 and 4, the memory pillar MP is shown to deviate to the wiringlayer 10-0 a side in the Y direction. As a result, for the wiring layers10-1 and 11-1 and the memory pillars MP0 and MP4, the memory pillar MP0overlaps the wiring layers 10-1 and 11-1 by a distance d1, and thememory pillar MP4 overlaps the wiring layers 10-1 and 11-1 by a distanced2, and a relation of d1>d2 is formed. A similar relation is formedbetween the memory pillars MP8 and MP12.

In other words, for the memory group MG1, the memory cell transistor MTconnected to an even-numbered bit line BLe has a large cell size, andthe memory cell transistor MT connected to an odd-numbered bit line BLohas a small cell size. A large/small cell size may be rephrased by alarge/small current driving capability of the memory cell transistor MT.

In other words, as is apparent from FIG. 3, in a case where aneven-numbered select gate line SGDe is selected, memory cell transistorsMT connected to the bit lines BL0 and BL2, in other words, the memorycell transistors MT belonging to the group GR1 have small sizes. On theother hand, memory cell transistors MT connected to the bit lines BL andBL3, in other words, the memory cell transistors MT belonging to thegroup GR2 have large sizes.

To the contrary, in a case where an odd-numbered select gate line SGDois selected, memory cell transistors MT connected to the bit lines BL0and BL2, in other words, the memory cell transistors MT belonging to thegroup GR1 have large sizes. On the other hand, memory cell transistorsMT connected to the bit lines BL1 and BL3, in other words, the memorycell transistors MT belonging to the group GR2 have small sizes.

In this way, in a case where the position of the memory pillar MPdeviates, the memory cell transistors MT having different sizes arealternately arranged on the same page. Thus, in this embodiment,according to the size of the selected memory cell transistor MT, thepre-charge electric potential at the time of a read operation iscontrolled by the sense amplifier 4.

More specifically, when an even-numbered select gate line SGDe, in otherwords, an even-numbered memory group MGe is to be selected, the senseamplifier 4 applies high pre-charge potential VBL1 to the bit lines BLof the group GR1 and applies low pre-charge potential VBL2 to the bitlines BL of the group GR2. On the other hand, when an odd-numberedselect gate line SGDo, in other words, an odd-numbered memory group MGois to be selected, the sense amplifier 4 applies low pre-chargepotential VBL2 to the bit lines BL of the group GR1 and applies highpre-charge potential VBL1 to the bit lines BL of the group GR2.

As a result, a difference in the current driving force according to thecell size of the memory cell transistor MT is offset by the pre-chargepotential, and a difference in the cell current flowing through the bitline BL at the time of a read operation between bit lines can bedecreased. In other words, a condition for the flow of a sufficientlylarge cell current is applied to a memory cell transistor MT throughwhich it is difficult for the cell current to flow, and a condition forpreventing the cell current is applied to a memory cell transistor MTthrough which it is easy for the cell current to flow. Accordingly,particularly, the occurrence of erroneous read from the memory celltransistor MT through which it is difficult for the cell current to flowis prevented, and the operational reliability of the semiconductormemory device can be improved.

In the configuration according to this embodiment, as illustrated inFIG. 3, the wiring layers 10-0 a and 10-0 b positioned at both endportions of the block BLK are simultaneously selected and function asthe select gate line SGD0. The reason for this is that, while fourmemory pillars MP (memory cell transistors MT) are formed in each of theother wiring layers 10-1 to 10-7, only two memory pillars MP (memorycell transistors MT) are formed in each of the wiring layers 10-0 a and10-0 b. Thus, for both the end portions of the block BLK, the two wiringlayers 10-0 a and 10-0 b are caused to function electrically as oneselect gate line SGD. Accordingly, also when the select gate line SGD0is selected, the size of one page is the same as that of a case whereany one of the other select gate lines SGD1 to SGD7 is selected.

As a result of the alignment of page sizes as described above, asillustrated in FIG. 3, the number of wiring layers 10 functioning asselect gate lines SGD within one block BLK is an odd number in the XYplane. As illustrated in FIG. 4, this similarly applies also to thewiring layer 11 functioning as word lines WL. In other words, when seenin the XY plane, the number of wiring layers positioned between theslits SLT1 is an odd number.

The side of the deviation of the memory pillars MP may be opposite tothat of the case illustrated in FIGS. 3 and 4. The appearance of such acase is illustrated in FIG. 15. FIG. 15 illustrates a planar layout ofselect gate lines SGD according to a modified example of thisembodiment. As illustrated in the drawing, in this example, thepositions of memory pillars MP deviate to the wiring layer 10-0 b sidein the Y direction, which is opposite to that of the case illustrated inFIG. 3. As a result, for the wiring layers 10-1 and 11-1 and the memorypillars MP0 and MP4, the memory pillar MP0 overlaps the wiring layers10-1 and 11-1 by a distance d2, and the memory pillar MP4 overlaps thewiring layers 10-1 and 11-1 by a distance d1 (>d2). In this case,voltages applied to the bit lines BL at the time of reading data areopposite to those of the case of the embodiment described above.

In other words, when an even-numbered select gate line SGDe, in otherwords, an even-numbered memory group MGe is to be selected, the senseamplifier 4 applies low pre-charge potential VBL2 to the bit lines BL ofthe group GR1 and applies high pre-charge potential VBL1 to the bitlines BL of the group GR2. On the other hand, when an odd-numberedselect gate line SGDo, in other words, an odd-numbered memory group MGois to be selected, the sense amplifier 4 applies high pre-chargepotential VBL1 to the bit lines BL of the group GR1 and applies lowpre-charge potential VBL2 to the bit lines BL of the group GR2.

2. Second Embodiment

Next, a semiconductor memory device according to a second embodimentwill be described. This embodiment relates to a write operationaccording to the first embodiment. Hereinafter, only points differentfrom those of the first embodiment will be described.

2.1 First Example

First, a first example will be described. A data writing operationincludes a program operation changing a threshold by injecting electronsinto a charge storage layer and a program verification operationchecking whether or not the threshold arrives at a defined value as aresult of the program operation. According to the first example, in theprogram operation, voltages applied to bit lines BL are configured to bedifferent between groups GR1 and GR2.

FIG. 16 is a timing diagram that illustrates voltage changes in variouswirings when an odd-numbered select gate line SGDo (in other words, anodd-numbered memory group MG) and a word line WLo0 are selected at thetime of writing data.

As illustrated in FIGS. 12 and 13, in a case where an odd-numberedselect gate line SGDo is selected, the memory cell transistors MTbelonging to the group GR1 (BL0 and BL2) have large sizes, and thememory cell transistors MT belonging to the group GR2 (BL1 and BL3) havesmall sizes. As an overlapping area between the word lines WL and thememory pillars MP increases, the coupling rate increases, and thewriting speed of the memory cell transistor MT increases. In otherwords, the group GR1 has a high writing speed is high, the group GR2 hasa low writing speed.

Accordingly, at time t2, the sense amplifier 4 applies a relatively highvoltage VCH2 to the bit lines BL0 and BL2 belonging to the group GR1 andapplies a low voltage VCH1 to the bit lines BL1 and BL3 belonging to thegroup GR2. Here, VCH2>VCH1.

Subsequently, the row decoder 3 applies a voltage VPASS to all the wordlines WL0 to WL7 at time t4 and raises the voltage of the selected wordline WLo0 from VPASS to VPGM at time t5. The voltage VPASS is a voltagethat can be used for turning on the memory cell transistor MT regardlessof stored data and sufficiently raising the channel electric potentialof a non-selected NAND string 50 through coupling. In addition, thevoltage VPGM is a high voltage used for injecting electrons into thecharge storage layer through FN tunneling. Here VPGM>VPASS.

According to this method, by configuring a bit line voltagecorresponding to a memory cell transistor MT having a high writing speedto be high, the wiring speed can be lowered. Accordingly, a differencein the writing speed between the groups GR1 and GR2 can be decreased.

2.2 Second Example

Next, a second example will be described. According to the secondexample, at the time of a program operation, the value of the voltageVPGM applied to the selected word line WL is changed between the groupsGR1 and GR2.

FIG. 17 is a timing diagram that illustrates a change in the electricpotential of a selected word line WL and bit lines BL according to thisexample and illustrates a case where an even-numbered memory group MG,in other words, an even-numbered select gate line SGDe is selected.

As described above, a write operation includes a program operation and aprogram verification operation. This combination is called a softwareprogram loop. In a write operation, by repeating the software programloop a plurality number of times, data corresponding to one page iswritten.

In this example, at the time of a program operation, two kinds ofprogram voltages VPGM1 and VPGM2 are applied to a selected word line WL,and there is a relation of VPGM2>VPGM1. In a case where an even-numberedmemory group MG is selected, the writing speeds of the memory celltransistors MT belonging to the group GR1 (BL0 and BL2) are low, and thewriting speeds of the memory cell transistors MT belonging to the groupGR2 (BL1 and BL3) are high. Accordingly, the voltage VPGM1 is used as aprogram voltage for the group GR2, and the voltage VPGM2 is used as aprogram voltage for the group GR1.

More specifically, during a period in which the voltage VPGM1 isapplied, a write-protect voltage VBL is applied to the bit lines BL0 andBL2 of the group GR1, and a write voltage (for example, 0 V, which islower than the voltage VBL) is applied to the bit lines BL1 and BL3 ofthe group GR2. As a result, data is programmed in the memory celltransistors MT connected to the bit lines BL1 and BL3.

On the other hand, during a period in which the voltage VPGM2 isapplied, the write-protect voltage VBL is applied to the bit lines BL1and BL3 of the group GR2, and the write voltage is applied to the bitlines BL0 and BL2 of the group GR1. As a result, data is programmed inthe memory cell transistors MT connected to the bit lines BL0 and BL2.

According to this method, a high program voltage is used for the memorycell transistors MT having low writing speeds, and a low program voltageis used for the memory cell transistors having high writing speeds. Inthis way, a difference in the writing speed between the groups GR1 andGR2 can be decreased. In addition, a step-up width ΔVPGM of the programvoltage VPGM may be changed in the groups GR1 and GR2. It is apparentthat the step-up width ΔVPGM is large in the group having a low writingspeed.

2.3 Third Example

Next, a third example will be described. In the third example, at thetime of a program verification operation, by configuring pre-chargepotential for the group having a low writing speed to be low, a cellcurrent is relatively decreased. In other words, a method of applyingvoltages to the bit lines BL is similar to that illustrated in FIG. 14described in the first embodiment.

According to this method, in a memory cell transistor having a lowwriting speed, as the software program loop is repeated a plurality ofnumber of times, the threshold of the cell increases, and it isdifficult for the cell current flows, whereby it becomes easy to passthe program verification. As a result, a difference in the writing speedbetween the groups GR1 and GR2 can be decreased.

2.4 Effects Relating to this Embodiment

According to this embodiment, also in a case where a writing speed isdifferent between memory cell transistors belonging to the same page,the numbers of software program loops for these to pass the programverification can be configured to be a same level. Accordingly, thenumber of times of performing the software program loop can bedecreased, and a purchasing speed can be improved. In addition, it canprevent a situation where a memory cell transistor having a high writingspeed quickly passes the program verification and thereafter, isdisturbed by a write operation for a memory cell transistor having a lowwriting speed for a long time. Accordingly, the reliability of the writeoperation can be improved.

3. Third Embodiment

Next, a semiconductor memory device according to a third embodiment willbe described. This embodiment relates to a planar layout that isdifferent from those of the first and second embodiments, and, forexample, two bit lines are disposed above one memory pillar.Hereinafter, only points different from the first and second embodimentswill be described.

3.1 Planar Layout

FIGS. 18 and 19 illustrate planar layouts of select gate lines SGD of acertain block BLK in the XY plane. FIG. 18 also illustrates theappearance of bit lines BL in the same manner as FIG. 3 in the firstembodiment. In FIG. 19, the illustration of a memory cell portion issimplified, and, particularly, the configurations of a first connectionportion and a second connection portion are focused. In this example, acase where four select gate lines SGD are provided in one block BLK willbe described.

As illustrated in the drawing, nine conductive layers 10 extending inthe X direction are provided. In this example, the wiring layers 10-1 to10-7 and 10-0 b described in FIG. 3 are respectively relabeled as wiringlayers 10-1 a, 10-2 a, 10-3 a, 10-0 b, 10-1 b, 10-2 b, 10-3 b, and 10-0c. A slit SLT2 is disposed between the wiring layers 10, which issimilar to the first embodiment.

Within a block BLK, two wiring layers 10-0 a and 10-0 c positioned atboth ends in the Y direction and a wiring layer 10-0 b positioned at thecenter function as a select gate line SGD0. These three wiring layers10-0, as illustrated in FIG. 19, for example, in the first connectionportion, are commonly connected by using a contact plug 49 and a metalwiring layer 51, and are further connected to a row decoder 3. Inaddition, the wiring layers 10-1 a and 10-1 b are commonly connected inthe second connection portion by using a contact plug 52 and a metalwiring layer 53, and are further connected to the row decoder 3.Furthermore, the wiring layers 10-2 a and 10-2 b are commonly connectedin the second connection portion by using the contact plug 49 and themetal wiring layer 51, and are further connected to the row decoder 3.In addition, the wiring layers 10-3 a and 10-3 b are commonly connectedin the first connection portion by using the contact plug 52 and themetal wiring layer 53, and are further connected to the row decoder 3.

As illustrated in FIG. 18, two bit lines BL pass above one memory pillarMP. However, only one of these two bit lines BL is connected to thememory pillar MP.

In other words, above the memory pillars MP0 to MP3, two bit lines BL0and BL1 are disposed. The bit line BL0 is commonly connected to thememory pillars MP1 and MP2, and the bit line BL1 is commonly connectedto the memory pillars MP0 and MP3. In addition, above the memory pillarsMP4 to MP7, two bit lines BL2 and BL3 are disposed. The bit line BL2 iscommonly connected to the memory pillars MP4 and MP5, and the bit lineBL3 is commonly connected to the memory pillars MP6 and MP7.Furthermore, above the memory pillars MP8 to MP11, two bit lines BL4 andBL5 are disposed. The bit line BL4 is commonly connected to the memorypillars MP9 and MP10, and the bit line BL5 is commonly connected to thememory pillars MP8 and MP11. In addition, above the memory pillars MP12to MP15, two bit lines BL6 and BL7 are disposed. The bit line BL6 iscommonly connected to the memory pillars MP12 and MP13, and the bit lineBL7 is commonly connected to the memory pillars MP14 and MP15.Accordingly, in the case of this example, the bit lines BL0, BL1, BL4,and BL5 and the memory pillars MP0 to MP3 and MP8 to MP11 belong to agroup GR1, and the bit lines BL2, BL3, BL6, and BL7, and the memorypillars MP4 to MP7 and MP12 to MP15 belong to a group GR2.

The other configurations are as described in the first embodiment.

3.2 Page Selecting Method

Next, a method of selecting page at the time of reading data and at thetime of writing data will be described.

In this example, two or three wiring layers 10 are commonly connected.Accordingly, the plurality of wiring layers 10 that are commonlyconnected are simultaneously selected. FIGS. 20 and 21 are planar layoutdiagrams of select gate lines SGD in the XY plane that correspond toFIG. 18 described above, and diagonal lines are applied to wiring layers10 corresponding to a selected gate line SGD.

As illustrated in FIG. 20, when one of select gate lines SGD1 to SGD3 isselected, corresponding two wiring layers 10 are selected. In FIG. 20, acase is illustrated in which the select gate line SGD1 is selected. Inthis case, as the two wiring layers 10-1 a and 10-1 b are selected,eight memory cell transistors MT disposed in the memory pillars MP0,MP4, MP8, and MP12 and the memory pillars MP2, MP6, MP10, and MP14 areselected. In other words, one page is formed by eight memory celltransistors MT belonging to the wiring layers 11-1 a and 11-1 bcorresponding to one of the word lines WL disposed right below thewiring layers 10-1 a and 10-1 b. This similarly applies also to a casewhere the select gate lines SGD2 and SGD3 are selected.

In contrast to this, in a case where the select gate line SGD0 isselected, as illustrated in FIG. 21, three wiring layers 10 including awiring layer 10-0 b positioned at the center of the block BLK inaddition to wiring layers 10-0 a and 10-0 c positioned at both endswithin the block BLK are simultaneously selected. Accordingly, twomemory cell transistors MT that are disposed in the memory pillars MP4and MP12 positioned right below the wiring layer 10-0 a, two memory celltransistors MT that are disposed in the memory pillars MP3 and MP11positioned right below the wiring layer 10-0 c and, and four memory celltransistors MT that are disposed in the memory pillars MP1, MP6, MP9,and MP14 positioned right below the wiring layer 10-0 b are selected. Inother words, one page is formed by such eight memory cell transistorsMT.

The method of reading data and the method of writing data are describedin the first and second embodiment.

3.3 Effect Relating to this Embodiment

According to this embodiment, by causing two or more wiring layers 10 tofunction as one select gate line SGD, the size of one page can beincreased. In addition, in the method of connecting the select gatelines SGD according to this example, when a plurality of wiring layers10 are selected, the effects of interferences between cells received bymemory cell transistors MT associated with each wiring layer (includingthe effects of capacitance and resistance) can be almost the samebetween the wiring layers.

For example, in FIG. 19, in a case where the select gate line SGD2 isselected, the wiring layers 10-2 a and 10-2 b are charged. The wiringlayers 10 adjacent to the wiring layer 10-2 a in the Y direction are thewiring layers 10-1 a functioning as the select gate line SGD1 and 10-3 afunctioning as the wiring layer SGD3. The wiring layers 10 adjacent tothe wiring layer 10-2 b in the Y direction are the wiring layers 10-1 band 10-3 b functioning as the select gate lines SGD1 and SGD3. In thisway, while one select gate line SGD is divided into two wirings in thememory cell portion, a combination of select gate lines adjacent to eachother in the Y direction is common to these divided two wirings. Inother words, the influences received by the divided two wirings from thewirings adjacent to each other are almost the same. This is similar alsoto a case where any one of the select gate lines SGD is selected.Accordingly, characteristic variations between the select gate lines SGDare prevented, and the operational reliability can be improved.

FIG. 22 is a plan view of select gate lines SGD according to a modifiedexample of this embodiment in the XY plane. As illustrated in thedrawing, this example illustrates an example of a case where the numberof wirings 10 within one block BLK is 17. As illustrated in the drawing,for example, wiring layers 10-0 a, 10-1 a, 10-2 a, 10-3 a, 10-4 a, 10-5a, 10-6 a, 10-7 a, 10-0 b, 10-1 b, 10-2 b, 10-3 b, 10-4 b, 10-5 b, 10-6b, 10-7 b, and 10-0 c are sequentially arranged in the Y direction. Thewiring layers 10-0 a and 10-0 c positioned at both ends and the wiringlayer 10-b positioned at the center function as a select gate line SGD0.In addition, the wiring layers 10-1 a and 10-1 b function as a selectgate line SGD1, the wiring layers 10-2 a and 10-2 b function as a selectgate line SGD2, and so on. In this way, the number of the wiring layers10 can be appropriately increased.

The different configurations can be generally represented as in FIG. 23.FIG. 23 is a planar layout of select gate lines SGD. As illustrated inthe drawing, (2n+1) wiring layers 10-1 to 10-(2n+1) are arranged in theY direction. Here, n is a natural number of two or more. The firstwiring layer 10-1, the wiring layer 10-(n+1) positioned at the center,and the last wiring layer 10-(2n+1) are commonly connected. Among theremaining wiring layers 10, the i-th wiring layer and the (i+n)-thwiring layer are commonly connected. Here, i is a natural number of 2 ton.

4. Fourth Embodiment

Next, a semiconductor memory device according to a fourth embodimentwill be described. This embodiment relates to an example different fromthe third embodiment in the method of connecting the wiring layers 10functioning as the select gate line SGD. Hereinafter, only pointsdifferent from the first to third embodiments will be described.

4.1 Planar Layout

FIG. 24 is a planar layout of select gate lines SGD in a certain blockBLK on the XY plane and corresponds to FIG. 19 described in the thirdembodiment. While the bit lines BL are not illustrated, the bit lines BLare similar to those according to the third embodiment.

As illustrated in the drawing, in the layout according to this example,two wiring layers 10-0 a and 10-0 c disposed at both ends with onewiring layer 10 and one wiring layer 10-0 b interposed therebetween inthe Y direction are drawn out up to a first connection portion and arecommonly connected. These three wring layers 10-0 a, 10-0 b, and 10-0 cfunction as a select gate line SGD0. Among the remaining wiring layers10, two wiring layers adjacent to each other with one wiring layer 10interposed therebetween in the Y direction are commonly connected in aconnection portion. In other words, as illustrated in FIG. 24, thewiring layers 10-1 a and 10-1 b are drawn out up to a second connectionportion to be commonly connected and function as a select gate lineSGD1. In addition, the wiring layers 10-2 a and 10-2 b are drawn out upto the first connection portion to be commonly connected and function asa select gate line SGD2. Furthermore, the wiring layers 10-3 a and 10-3b are drawn out up to the second connection portion to be commonlyconnected and function as a select gate line SGD3.

At the time of reading data and at the time of writing data, two orthree wiring layers 10 that are commonly connected in the firstconnection portion or the second connection portion are simultaneouslydriven.

4.2 Effect According to this Embodiment

As above, as the method of connecting select gate lines SGD described inthe third embodiment, a method according to this embodiment may be used.According to this embodiment, since there is no intersection between theplurality of wiring layers 10, the plurality of wiring layers 10 can becommonly connected in the layer of the wiring layers 10. In other words,similar to the case illustrated in FIG. 19, an additional layer does notneed to be used by using the contact plug and the metal wiring layer.Therefore, the manufacturing method can be simplified.

FIG. 25 is a planar layout of select gate lines SGD according to amodified example of this embodiment and, similar to FIG. 22, illustratesan example of a case where the number of wiring layers 10 within oneblock BLK is 17. As illustrated in the drawing, two wiring layers 10disposed at both ends in the Y direction and a third wiring layer 10,are drawn out up to the first connection portion and function as aselect gate line SGD0. The other wiring layers, similar to thoseillustrated in FIG. 24, two wiring layers 10 that are adjacent to eachother in the Y direction with a certain wiring layer 10 interposedtherebetween are commonly connected in the first connection portion orthe second connection portion.

FIG. 26 illustrates an appearance in which (2n+1) writing layers 10-1 to10-(2n+1) are arranged in the Y direction. Here, n is a natural numberof two or more. The first wiring layer 10-1, the third wiring layer10-3, and the last wiring layer 10-(2n+1) are commonly connected. Amongthe remaining wiring layers 10 and the (k+2)-th wiring layers arecommonly connected. Here, k is 2, 5, 6, 7, 10, . . . , 10-(2n−3), and10-(2n−2).

5. Modified Examples

As above, the semiconductor memory device according to the embodimentincludes: a first region (denoted by BLK in FIG. 3) that is disposedabove the semiconductor substrate and includes a plurality of firstwirings (denoted by SGD in FIG. 3) arranged in parallel with each otherin a first direction (X direction in FIG. 3) that is an in-planedirection of the semiconductor substrate, first insulating films(denoted by SLT2 in FIG. 3) separating the first wirings (denoted by SGDin FIG. 3) adjacent to each other and first pillars (denoted by MP inFIG. 3) disposed to straddle the first wirings (denoted by SGD in FIG.3) that are adjacent to each other; and second and third regions(denoted by SLT1 in FIG. 3) that are positioned to have the first region(BLK) interposed therebetween in a second direction (the Y directionillustrated in FIG. 3) which is different from the first direction andwhich is an in-plane direction of the semiconductor substrate andinclude second insulating films disposed from the semiconductorsubstrate to the height of the first wirings (denoted by SGD in FIG. 3).The first pillar (MP) includes a conductive layer, a gate insulatingfilm, and a charge storage layer (FIGS. 7 to 10). The number of thefirst wirings (SGD) disposed within the first region (denoted by BLK inFIG. 3) is an odd number (FIG. 3).

According to this configuration, the operation of the semiconductormemory device can be improved. The embodiments described above aremerely examples, and various modifications thereof can be made.

For example, in the embodiments described above, while a case where thenumber of bit lines BL passing above the memory pillar MP is one or twois described as an example, the number of bit lines may be three, four,or more. In addition, the number of select gate lines SGD is not limitedto 9 or 17. Furthermore, the configuration in which two NAND strings aredisposed inside the memory pillar MP is not limited to the structuredescribed in the first embodiment described above. Such a structure is,for example, described in U.S. patent application Publication Ser. No.14/819,706 filed on Aug. 6, 2015, entitled “SEMICONDUCTOR MEMORY DEVICEand METHOD FOR MANUFACTURING THE SAME,” and the entire contents of suchpatent application are incorporated herein by reference.

In addition, in the embodiments described above, the planar layout ofthe word lines WL is described with reference to FIG. 4. However, thenumber of word lines WL provided in one block BLK can be appropriatelyselected, and the method of connecting the word lines WL can beappropriately selected. In addition, for example, as illustrated in FIG.27, a configuration in which the configuration illustrated in FIG. 4 isarranged in two stages in the Y direction may be employed. In thisconfiguration, the slit SLT1 is disposed not only at both ends of oneblock BLK in the Y direction but at the center of the block BLK. In theexample illustrated in FIG. 27, on one side having the slits SLT1interposed therebetween, four word lines WL are commonly connected inthe first connection portion, and the remaining three word lines WL arecommonly connected in the second connection portion. On the other hand,on the other side having the slits SLT1 interposed therebetween, fourword lines WL are connected in the second connection portion, and theremaining three word lines WL are connected in the first connectionportion. Two sets of word line WL group having the slit SLT1 interposedtherebetween are connected using the wiring layers 60 and 61. In thisconfiguration, the number (nine in the case illustrated in FIG. 27) ofword lines WL driven from the first connection portion side and thenumber of word lines WL driven from the second connection portion sidecan be configured to be the same.

In addition, the selection transistor ST2, for example, may include twotransistor structures. FIG. 28 is an equivalent circuit diagramcorresponding to one memory pillar MP. As illustrated in the drawing,the selection transistor ST2 may include two transistors ST2-1 and ST2-2that are commonly connected. FIG. 29 is a cross-sectional view of theselection transistor ST2. As illustrated in the drawing, while theselection transistor ST2-1 is formed in the memory pillar MP, theselection transistor ST2-2 is formed on a p-type well area 13. In otherwords, the gate insulating film 70 is formed on the well area 13, andthe gate electrode 12 is disposed on the gate insulating film 70. Inaddition, inside the well area 13, an n-type impurity diffusion layer 71functioning as a source area is disposed inside the well area 13.According to this configuration, for example, by using the diffusionlayer 71 and the like, electric potential can be applied to a back gateof the transistor ST2-2.

In addition, in each exemplary embodiment of the present disclosure, (1)for example, in a case where the memory cell transistor MT can storedata of two bits, threshold voltage are “Er”, “A”, “B”, and “C” levelsin order of lowest to highest threshold voltages, and the “Er” level isan erase state, a voltage applied to a word line selected for a readoperation of the “A” level, for example, is between 0 V to 0.55 V.However, the applied voltage is not limited thereto but may be betweenany one of 0.1 V to 0.24 V, 0.21 V to 0.31 V, 0.31 V to 0.4 V, 0.4 V to0.5 V, and 0.5 V to 0.55 V.

In addition, a voltage applied to a word line selected for a readoperation of the “B” level, for example, is between 1.5 V to 2.3 V.However, the applied voltage is not limited thereto but may be betweenany one of 1.65 V to 1.8 V, 1.8 V to 1.95 V, 1.95 V to 2.1 V, and 2.1 Vto 2.3 V.

A voltage applied to a word line selected for a read operation of the“C” level, for example, is between 3.0 V to 4.0 V. However, the appliedvoltage is not limited thereto but may be between any one of 3.0 V to3.2 V, 3.2 V to 3.4 V, 3.4 V to 3.5 V, 3.5 V to 3.6 V, and 3.6 V to 4.0V.

A time (tR) of a read operation, for example, may be between 25 μs to 38μs, 38 μs to 70 μs, or 70 μs to 80 μs.

(2) A write operation includes a program operation and a verificationoperation. In a write operation, a voltage that is initially applied toa word line selected at the time of a program operation is, for example,between 13.7 V to 14.3 V. However, the applied voltage is not limitedthereto but, for example, may be between any one of 13.7 V to 14.0 V and14.0 V to 14.6 V.

The voltage that is initially applied to a selected word line when datais written into an odd-numbered word line and the voltage that isinitially applied to a selected word line when data is written into aneven-numbered word line may be changed.

When a program operation is performed in an incremental step pulseprogram (ISPP) type, the step-up voltage, for example, is about 0.5 V.

A voltage applied to a non-selected word line, for example, may bebetween 6.0 V to 7.3 V. However, the applied voltage is not limitedthereto but, for example, may be between 7.3 V to 8.4 V or may be 6.0 Vor less.

An applied pass voltage may be changed based on whether a non-selectedword line is an odd-numbered word line or an even-numbered word line.

A time (tProg) of a write operation, for example, may be between 1700 μsto 1800 μs, 1800 μs to 1900 μs, or 1900 μs to 2000 μs.

(3) In an erase operation, a voltage that is initially applied to a wellwhich is formed on an upper portion of the semiconductor substrate andabove which the memory cell is disposed is, for example, between 12 V to13.6 V. However, the applied voltage is not limited thereto but, forexample, may be between 13.6 V to 14.8 V, 14.8 V to 19.0 V, 19.0 to 19.8V, or 19.8 V to 21 V.

A time (tErase) of an erase operation may be, for example, between 3000μs to 4000 μs, 4000 μs to 5000 μs, or 4000 μs to 9000 μs.

(4) Structure of Memory Cell

The charge storage layer disposed on the semiconductor substrate (e.g.,silicon substrate) through a tunnel insulating film having a thicknessof 4 to 10 nm is provided. This charge storage layer may have a stackingstructure of an insulating film of SiN, SiON, or the like having athickness of 2 to 3 nm and a polysilicon film having a thickness of 3 to8 nm. In addition, metal such as Ru may be added to the polysiliconfilm. On the charge storage layer, an insulating film is provided. Thisinsulating film, for example, includes a silicon oxide film having athickness of 4 to 10 nm interposed between a lower layer high-k filmhaving a thickness of 3 nm to 10 nm and an upper layer high-k filmhaving a thickness of 3 nm to 10 nm. An example of the high-k film isHfO. In addition, the thickness of the silicon oxide film may be formedto be larger than the thickness of the high-k film. On the insulatingfilm, a control electrode having a film thickness of 30 nm to 70 nm isformed through a material used for adjusting a work function having afilm thickness of 3 nm to 10 nm. Here, the material used for adjusting awork function is a metal oxide film of TaO or the like or a metalnitride film of TaN or the like. W or the like may be used for thecontrol electrode.

In addition, an air gap may be formed between memory cells.

Furthermore, in the embodiments described above, while the NAND flashmemory is described as the semiconductor memory device as an example,the semiconductor memory device is not limited to the NAND flash memory.Thus, as the semiconductor memory, one of the other overallsemiconductor memories may be applied, and furthermore, one of variousmemory devices other than the semiconductor memory may be applied.

While certain embodiments have been described, these embodiments havebeen presented by way of example only, and are not intended to limit thescope of the inventions. Indeed, the novel embodiments described hereinmay be embodied in a variety of other forms; furthermore, variousomissions, substitutions and changes in the form of the embodimentsdescribed herein may be made without departing from the spirit of theinventions. The accompanying claims and their equivalents are intendedto cover such forms or modifications as would fall within the scope andspirit of the inventions.

What is claimed is:
 1. A semiconductor memory device, comprising: a semiconductor substrate extending in a first direction and a second direction crossing the first direction; a plurality of odd word lines stacked in a third direction crossing the first and second directions, each of the odd word lines including: a plurality of first line portions extending in the first direction and being spaced at intervals in the second direction, and a first connection portion extending in the second direction and electrically connecting the first line portions; a plurality of even word lines stacked in the third direction, each of the even word lines including: a plurality of second line portions extending in the first direction and being spaced at intervals in the second direction, the first line portions and the second line portions being alternately arranged in the second direction, and a second connection portion extending in the second direction and electrically connecting the second line portions; a plurality of pillars that are each extending in the third direction to intersect gaps between the odd word lines and even word lines toward the semiconductor substrate, the pillars including: a first pillar intersecting one side of one of the second line portions in the second direction, a second pillar intersecting another side of the one of the second line portions in the second direction, a third pillar intersecting the one side of the one of the second line portions in the second direction, a fourth pillar intersecting the another side of the one of the second line portions in the second direction, a fifth pillar intersecting one side of another one of the second line portions in the second direction, a sixth pillar intersection another side of the another one of the second line portions in the second direction, a seventh pillar intersecting the one side of the another one of the second line portions in the second direction, an eighth pillar intersecting the another side of the another one of the second line portions in the second direction, the first to fourth pillars arranged in order along the first direction, the fifth to eighth pillars arranged in order along the first direction; and a plurality of bit lines that are each extending in parallel along the second direction and spaced each other in the first direction, the bit lines including: a first bit line connected to the first pillar, a second bit line connected to the fifth pillar, a third bit line connected to the second pillar, a fourth bit line connected to the sixth pillar, a fifth bit line connected to the third pillar, a sixth bit line connected to the seventh pillar, a seventh bit line connected to the fourth pillar, and an eighth bit line connected to the eighth bit line, the first to eighth bit lines being arranged in order along the first direction.
 2. The semiconductor memory device according to claim 1, wherein, during a program operation: a first program voltage is applied to the second wiring, a first voltage is applied to the first, second, fifth, and sixth bit lines, and a second voltage is applied to the third, fourth, seventh, and eighth bit lines, the second voltage being different from the first voltage.
 3. The semiconductor memory device according to claim 2, wherein the first voltage is greater than the second voltage.
 4. The semiconductor memory device according to claim 1, further comprising: a plurality of select gate lines each extending in parallel along the first direction, spaced from each other in the second direction, and above the odd word lines and the even word lines in the third direction, each of the select gate lines being electrically connected to at least one other of the select gate lines.
 5. The semiconductor memory device according to claim 1, further comprising: a first gap between the first pillar and the one of the second line portions; a second gap between the second pillar and the one of the second line portions; a third gap between the third pillar and the one of the second line portions; and a fourth gap between the fourth pillar and the one of the second line portions.
 6. The semiconductor memory device according to claim 5, wherein a planar area of the first gap as viewed from the third direction is greater than a planar area of the second gap as viewed from the third direction, and a planar area of the third gap as viewed from the third direction is greater than a planar area of the fourth gap as viewed from the third direction.
 7. The semiconductor memory device according to claim 6, wherein the planar area of the first gap and the planar area of the third gap are substantially the same, and the planar area of the second gap and the planar area of the fourth gap are substantially the same.
 8. The semiconductor memory device according to claim 7, further comprising: a fifth gap between the first pillar and the another one of the second line portions; a sixth gap between the second pillar and the another one of the second line portions; a seventh gap between the third pillar and the another one of the second line portions; and an eighth gap between the fourth pillar and the another one of the second line portions, wherein a planar area of the fifth gap as viewed from the third direction is greater than a planar area of the sixth gap as viewed from the third direction, a planar area of the seventh gap as viewed from the third direction is greater than a planar area of the eighth gap as viewed from the third direction, the planar area of the first gap, the planar area of the third gap, the planar area of the fifth gap, and the planar area of the seventh gap are substantially the same, and the planar area of the second gap, the planar area of the fourth gap, the planar area of the sixth gap, and the planar area of the eighth gap are substantially the same.
 9. The semiconductor memory device according to claim 5, wherein a planar area of the first gap as viewed from the third direction is substantially equal to a planar area of the third gap as viewed from the third direction, and a planar area of the second gap as viewed from the third direction is substantially equal to a planar area of the fourth gap as viewed from the third direction.
 10. A method of performing a write operation on semiconductor memory device having a semiconductor substrate extending in a first direction and a second direction crossing the first direction; a plurality of odd word lines stacked in a third direction crossing the first and second directions, each of the odd word lines including: a plurality of first line portions extending in the first direction and being spaced at intervals in the second direction, and a first connection portion extending in the second direction and electrically connecting the first line portions; a plurality of even word lines stacked in the third direction, each of the even word lines including: a plurality of second line portions extending in the first direction and being spaced at intervals in the second direction, the first line portions and the second line portions being alternately arranged in the second direction, and a second connection portion extending in the second direction and electrically connecting the second line portions; a plurality of pillars that are each extending in the third direction to intersect gaps between the odd word lines and even word lines toward the semiconductor substrate, the pillars including: a first pillar intersecting one side of one of the second line portions in the second direction, a second pillar intersecting another side of the one of the second line portions in the second direction, a third pillar intersecting the one side of the one of the second line portions in the second direction, a fourth pillar intersecting the another side of the one of the second line portions in the second direction, a fifth pillar intersecting one side of another one of the second line portions in the second direction, a sixth pillar intersection another side of the another one of the second line portions in the second direction, a seventh pillar intersecting the one side of the another one of the second line portions in the second direction, an eighth pillar intersecting the another side of the another one of the second line portions in the second direction, the first to fourth pillars arranged in order along the first direction, the fifth to eighth pillars arranged in order along the first direction; and a plurality of bit lines that are each extending in parallel along the second direction and spaced each other in the first direction, the bit lines including: a first bit line connected to the first pillar, a second bit line connected to the fifth pillar, a third bit line connected to the second pillar, a fourth bit line connected to the sixth pillar, a fifth bit line connected to the third pillar, a sixth bit line connected to the seventh pillar, a seventh bit line connected to the fourth pillar, and an eighth bit line connected to the eighth bit line, the first to eighth bit lines being arranged in order along the first direction, said method comprising: applying a first program voltage to the second wiring, applying a first voltage to the first, second, fifth, and sixth bit lines, and applying a second voltage to the third, fourth, seventh, and eighth bit lines, the second voltage being different from the first voltage.
 11. The method according to claim 10, wherein the first voltage is greater than the second voltage.
 12. The method according to claim 10, wherein the semiconductor memory device further comprises: a plurality of select gate lines each extending in parallel along the first direction, spaced from each other in the second direction, and above the odd word lines and the even word lines in the third direction, each of the select gate lines being electrically connected to at least one other of the select gate lines.
 13. The method according to claim 10, wherein the semiconductor memory device further comprises: a first gap between the first pillar and the one of the second line portions; a second gap between the second pillar and the one of the second line portions; a third gap between the third pillar and the one of the second line portions; and a fourth gap between the fourth pillar and the one of the second line portions.
 14. The method according to claim 13, wherein a planar area of the first gap as viewed from the third direction is greater than a planar area of the second gap as viewed from the third direction, and a planar area of the third gap as viewed from the third direction is greater than a planar area of the fourth gap as viewed from the third direction.
 15. The method according to claim 14, wherein the planar area of the first gap and the planar area of the third gap are substantially the same, and the planar area of the second gap and the planar area of the fourth gap are substantially the same.
 16. The method according to claim 15, wherein the semiconductor memory device further comprises: a fifth gap between the first pillar and the another one of the second line portions; a sixth gap between the second pillar and the another one of the second line portions; a seventh gap between the third pillar and the another one of the second line portions; and an eighth gap between the fourth pillar and the another one of the second line portions, wherein a planar area of the fifth gap as viewed from the third direction is greater than a planar area of the sixth gap as viewed from the third direction, a planar area of the seventh gap as viewed from the third direction is greater than a planar area of the eighth gap as viewed from the third direction, the planar area of the first gap, the planar area of the third gap, the planar area of the fifth gap, and the planar area of the seventh gap are substantially the same, and the planar area of the second gap, the planar area of the fourth gap, the planar area of the sixth gap, and the planar area of the eighth gap are substantially the same. 